Chemical vapor deposition (CVD) is a widely used materials-processing technology.
The majority of its applications involve applying solid thin-film coatings to surfaces.
In its simplest form, CVD involves flowing a precursor gas or gases into a chamber
containing one or more heated objects to be coated. Chemical reactions occur on and near the hot surfaces, resulting in the deposition of a thin film on the surface.
Enhanced CVD processes involve the use of plasmas, ions, photons, lasers, hot filaments, or combustion reactions to increase deposition rates and/or lower deposition temperatures.
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