Sputtering Systems

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Sputtering is a process whereby particles are ejected from a solid target material due to bombardment of the target by energetic particles, particularly gas ions.

Sputtering is done either using DC voltage (DC sputtering) or using power delivered at Radio Frequency (RF sputtering).

Other advanced sputtering process like Magnetron Sputtering, Reactive Gas Sputtering, Pulsed DC Sputtering etc. are also available.

We suggest you to get in touch with us to design the customized solutions based on your requirement.

RF Sputter Chamber
DC Sputter Chamber